All Publications
M. -J. Li, M. Breeden, V. Wang, J. Hollin, N. M. K. Linn, C. H. Winter, A. Kummel, and M. S. Bakir, "Cu–Cu Bonding Using Selective Cobalt Atomic Layer Deposition for 2.5-D/3-D Chip Integration Technologies," in IEEE Transactions on Components, Packaging and Manufacturing Technology, vol. 10, no. 12, pp. 2125-2128, Dec. 2020.